"Dear directors, if the EUV LLC Alliance theoretically proves that the technology of developing EUV lithography machines is feasible within the next two years, and this valuable opportunity and responsibility is handed over to GCA, the company cannot give up. However, the investment is huge, and the semiconductor industry is in recession. It is inevitable to avoid fighting on two fronts, resulting in insufficient funds, and we can only focus on the development of EUV lithography machines. I suggest that Mr. Adrian and Dean Thompson come forward to discuss with SVG to jointly develop 157nm lasers."
Sun Jian estimates that the EUV LLC Alliance will be able to prove the theoretical feasibility of manufacturing EUV lithography machines by the end of next year. However, it will take at least 10 years for mass production of EUV lithography machines. We cannot tell you now that BSEC will Provide the patented technology of 193nm immersion lithography machine to GCA for free.
BSEC is a 193nm immersion lithography machine technology successfully developed based on the first-generation 193nm ArF excimer laser patented technology owned by GCA. The core is the 193nm excimer laser owned by GCA. The second- and third-generation 193nm excimer lasers developed by GCA Excimer lasers are also licensed to BSEC technology; although the immersion lithography technology is a company invention patent redeveloped by BSEC, according to the original patent technology licensing transfer contract, it must be licensed to GCA for free, just like the third successful research and development by GCA last year. Generation (12-inch wafer, 90nm process technology) magnetic levitation dual workbench system, the patent still belongs to BSEC, and GCA is authorized to use it for free.
The 15um800nm process technology lithography machine is equipped with 6-inch wafers, the 500nm180nm process technology lithography machine is equipped with 8-inch wafers, and those below 90nm are equipped with 12-inch wafers. The matching magnetic levitation workbench systems are called the first generation and the third generation respectively. The second generation, the third generation, and there are descendants in one generation. The core technology is still the first generation where BSEC has the company's invention patent.
GCA successfully developed the second-generation and third-generation magnetically suspended dual-workbench systems, which were improved by the Lithography Machine Automation Research Institute led by Academician Chang Xia. The system was returned to GCA for use and authorized other lithography machine companies to upgrade.
The magnetically suspended dual workbench system developed by the BSEC Lithography Machine Automation Research Institute to support the 12-inch wafer and 65nm process immersion lithography machine will be called the fourth generation, 10nm will be called the fifth generation, and 7nm will be called the sixth generation. Generation... The company's invention patent for the magnetically suspended double workbench system owned by BSEC will not expire.
Although both companies are controlled by Sun Jian, and the backs of their hands are full of flesh, they strictly abide by the laws of the two countries and will not leave any basis for attack.
With GCA's current status, financial and technical strength, it is willing to jointly develop 157nm lasers with SVG, which is beneficial to both parties. How to persuade Papken to agree is not Sun Jian's concern.
"Okay, Chairman!"
"Okay, Chairman!"
Chairman Sun agreed to walk on two legs. Adrian and Thompson were relieved. They were confident to convince Papken.
Other directors also smiled.
Sun Jian couldn't persuade the company's top executives to give up research on 157nm lasers, so he had to compromise.
The 1999 financial report showed that SVG's sales revenue was only US$2.7 billion, which was less than GCA's 5.157nm laser technology route. It had been proven to have no great future in previous lives. Sun Jian could not say it clearly, and he could not explain it clearly. He just took advantage of this opportunity of the board of directors. The intention of GCA executives to invest US$1 billion to acquire SVG was rejected.
In the previous life, in order to enter the EUV LLC alliance and provide the U.S. government with a letter of nomination, ASML spent US$1.6 billion to acquire SVG with a market value of US$1 billion, and obtained the catadioptric lens technology required for 157nm lasers. Since it has successfully developed a 193nm immersion Lithography machine technology, the lithography effect exceeds Nikon's 157nm lithography machine technology, and SVG's 157nm laser technology is shelved.
In the previous life, Nikon worked hard. Two years after ASML successfully developed a 193nm immersion lithography machine, it also successfully developed a 157nm laser, overcame the world-class problem of 193nm wavelength, and successfully developed a 65nm process lithography machine, but the lithography effect was not as good as The ASML immersion lithography machine with 65nm process technology is good, but the three most important customers of lithography machines in the world, including Intel, TSMC and Samsung, do not buy it. Nikon has to start over and start to develop immersion lithography machines again. Nikon has strong technical strength. It was also developed successfully, but it took three or four years to go back and forth. The high-end lithography machine market was occupied by ASML. With the advent of EUV lithography machines, the ultra-high-end lithography machine market was also monopolized by ASML. The whole country of Japan Nikon has also failed to successfully develop an EUV lithography machine. Nikon has lost the qualification to compete with ASML and is dawdling in the mid-range lithography machine market.
Both the lithography machine industry and the wafer manufacturing industry are labor-intensive and capital-intensive industries, and the fittest survive. In the previous life, there were only 3 or 4 companies left in the world!
Whether BSEC can successfully develop an EUV lithography machine in the future is not Sun Jian's concern, just try your best!
I’m exhausted and the pain will be left to my family!
The reborn don’t want to be heroes either
Has ASML invested heavily in acquiring SVG? Obtain the catadioptric lens technology required for its 157nm laser and successfully develop the 157nm laser as soon as possible. As a strategic investor, TIC does not interfere with ASML's daily operating activities.
Canon, the world's digital camera overlord, looks down on the business of having only about 500 lithography machines in the world a year, and does not devote all its efforts to research and development of lithography machines. However, in March this year, it also successfully developed a 180nm process technology lithography machine, and is now developing a 90nm process technology. The technology level of its lithography machines ranks fourth in the world, and it occupies 50% of the global market share of mid- to low-end lithography machines.
SVG also successfully developed a 180nm process lithography machine in May this year. Its technical level ranks fifth in the world, accounting for 20% of the global mid- and low-end lithography machine market.
BSEC is also developing 180nm process lithography machines. With the help of the booming domestic market, BSEC occupies 30% of the global mid-to-low-end lithography machine market. It also has the world's No. 1 magnetic levitation dual workbench system technology and comprehensive strength. Tied for fifth place with SVG. The process technology of photolithography machines is much more complicated than the development of atomic bombs and satellites. In addition to huge costs, the photolithography machine industry also requires technology accumulation and talent accumulation. The domestic semiconductor industry chain in this era is not at the same level of competition as the United States and Japan. Opponent, it is impossible for BSEC to catch up with GCA or Nikon in 10 years. Sun Jian has a clear understanding that money is not everything since he took over! Without the world-class problem of 193nm wavelength, BSEC would not be able to catch up with GCA and Nikon in another 10 years.
The only difference between the EUV LLC alliance and its previous life is that the Dutch lithography machine company AMSL has become the American lithography machine company GCA.
In the previous life, in order to enter the EUV LLC alliance, ASML had to agree to the harsh conditions proposed by the U.S. government, including building a factory and a research and development center in the United States. 55% of the parts of the EUV lithography machines manufactured must be purchased by U.S. companies.
At least half of the technology in EUV lithography machines comes from American high-tech companies. This is a patented technology that ASML can never bypass.
BSEC lithography machines with 90nm process technology are not in mass production, and BSEC will not apply for company invention patents for immersion lithography machine technology.
