,!
As the end of the year approaches, Sun Jian has many important matters to deal with, and he will not sigh over the judgment of the Court of Final Appeal. Yesterday, he received a call from Wei Jianguo, saying that an 8-inch wafer and a 500nm process lithography machine were successfully developed at BSEC!
Although he received good news at the end of October that the R&D project had come to an end, Sun Jian was still very happy to receive the conclusive news. He flew to Beijing that day, congratulated all the R&D staff, and announced on the spot that the company had won Provide 3 million yuan to reward all R&D personnel according to their contribution.
Going from a 6-inch wafer and 800nm process technology lithography machine to an 8-inch wafer and 500nm process technology lithography machine is a big hurdle. BSEC invested 800 million yuan and took 18 months!
Once crossed, BSE and 180nm process technology lithography machines will be relatively easy.
Because after more than three years of hard work, the Lithography Machine Light Source Research Institute led by Academician Deng Guohui successfully developed the world's first immersion 193nm lithography machine testing machine on July 14. The wavelength reached 134nm, breaking through the 193nm wavelength limit worldwide. The problem is that the optical system used is produced by Carl Zeiss AG and does not have completely independent intellectual property rights. It is kept secret. After the optical system developed by the BSEC Lithography Machine Optics Research Institute meets the requirements, the company's invention patent will be applied for.
From the 193nm dry lithography machine to the 193nm immersion lithography machine, it has broken through the worldwide problem of the 193nm wavelength limit and is an epoch-making lithography technology.
In the late 1990s, as Moore's Law continued to evolve, the lithography machine process technology moved from 130nm to 90nm, and the wafer size also upgraded from 8 inches to 12 inches. However, no one expected that the semiconductor industry was stuck at the 193nm wavelength for nearly 10 years. 20 years!
Everyone has discovered that the limit process technology of dry 193nm lithography machines is 65nm, and it is difficult to achieve it further. How to break through 65nm and enter the 40nm process technology has become a roadblock in front of all semiconductor manufacturers.
The two major lithography machine giants are currently developing 130nm process technology lithography machines. There are also 90nm and 65nm process technology lithography machines. They have not yet reached the limit of the 65nm process technology!
The lithography machine light source used by BSEC is the GmArF excimer laser. In order to master its core technology, Deng Guohui and Qian Fuqiang led the lithography machine light source research technicians to throw away each other's drawings and develop it again. BSEC lithography machine company can now produce 193nm ArF excimer lasers that meet the requirements of 1um process technology, 800nm process technology and 500nm process technology. According to the company's invention patent transfer agreement originally signed by both parties, these excimer lasers can only be used on BSEC lithography machines.
In July 1995, Qian Fuqiang was promoted to researcher and served as director of the Lithography Machine Light Source Research Institute.
Dean Deng Guohui presides over the overall work of the BSEC Lithography Machine Research Institute.
BSEC can produce lithography machines for 8-inch wafers and 500nm process technology. Although there are still three hurdles to go before G-process lithography machines: 350nm, 250nm and 180nm, how difficult is it to take this step?
If you don’t personally participate in it, you don’t know how difficult it is during the research and development process!
The BSE process technology semiconductor production line is only a matter of time.
Beginning in June 1996, BSEC invested 800 million yuan in the development of 8-inch wafers and 500nm process lithography machines. Eighteen months passed in a flash. It was chaired by four academicians including Deng Guohui, Ouyang Ming, Chen Weichang and Xia Chang. This systematic research and development project has finally come to fruition.
The Lithography Machine Automation Research Institute has long prepared a magnetically suspended dual workbench system that meets the needs of 500nm process lithography machines. This system was successfully developed by GCA in 1995 based on the company's invention patent provided by BSEC. The patent belongs to BSEC .
Academician Chang Xia led the research staff of the institute to develop it again, and its performance was even more perfect! We have also developed a magnetically suspended dual workbench system that meets the needs of 350nm (also successfully developed by GCA) process technology lithography machines.
In May 1996, Academician Xia Chang led the Lithography Machine Automation Research Institute to take the lead in successfully developing a magnetically suspended dual workbench system that met the needs of 250nm process lithography machines.
BSEC Lithography Machine Company can now produce magnetically suspended dual workbench systems that can meet the needs of various process technology lithography machines, and can be produced to order.
The magnetic levitation double workbench system is still the only double workbench system in the world, which is also the contribution of Sun Jian.
Americans who value efficiency also believe that buying is worse than making, and they never worry about being stuck!
Fifty percent of lithography machine companies, such as GCA and ASML, choose the magnetically suspended dual workbench system produced by BSEC, and 50% of lithography machine companies, such as Nikon and ASML, purchase BSEC's company invention patents and organize production themselves.
To avoid wasting precious manpower and funds, under the instructions of Sun Jian, the GCA Lithography Machine and Semiconductor Research Institute stopped developing and producing the magnetically suspended dual workbench system in June 1996. The original 32 R&D personnel were replaced by BSEC Photolithography The Engraving Machine Automation Research Institute accepted all of them, and Gustrie wanted to buy them directly. He directly purchased the matching magnetic levitation double workbench system produced by BSEC. He never thought that BSEC would strangle GCA.
With the addition of 32 R&D personnel, the BSEC Lithography Machine Automation Research Institute has become even more powerful. The magnetically suspended dual workbench system developed by Academician Chang Xia to meet the needs of 180nm lithography machines has been put into mass production.
In December 1996, Academician Ouyang Ming led the Silicon Wafer Manufacturing Research Institute to successfully develop an 8-inch wafer with independent intellectual property rights, which was also a great initiative.
Academician Chen Weichang led the Institute of Lithography Optics and finally successfully developed an optical system that meets the needs of 500nm lithography machines.
BSEC finally synthesized the system, and the lithography machine company produced two 500nm process lithography machine development test prototypes.
The R&D and production of 8-inch wafer and 500nm process lithography machines is a complex systematic project, in which the light source system, optical system and dual workbench system are indispensable.
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On December 13, the exchange rate of the Korean won against the U.S. dollar suddenly dropped to 1737.60:1. The Korean won crisis also impacted the Japanese financial industry, which has a large amount of investment in South Korea.
On November 15, a financial crisis broke out in South Korea. On the 17th, the exchange rate of the Korean won against the U.S. dollar fell to a record high of 1,008:1; on the 20th, the exchange rate of the Korean won against the U.S. dollar fell to 1,139:1; on the 21st, the Korean government had to ask the international The IMF called for assistance and temporarily brought the crisis under control.
In the second half of 1997, a series of banks and securities companies including Tokyo Kyowa Credit Union, Tokyo Security Credit Union, Yamaichi Securities and Hokkaido Takushoku Bank went bankrupt one after another.
The myth that Japanese financial institutions will not fail has been shattered!
The Southeast Asian financial turmoil evolved into the Asian financial crisis.
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December 15th.
News of the sharp depreciation of the Korean won exchange rate fermented over the weekend.
The Hang Seng Index opened at 10599.4 points, opening 15.3 points lower. The bulls took the main action. The market quickly closed the gap and reached 10665.9 points. The short institutions began to exert their strength, profit taking and unwinding orders swarmed out, and the market It was broken through two important levels of 10,500 points and 10,400 points in succession, with the lowest reaching 10,346.2 points. In late trading, the main bulls took action again. The market closed at 10,435.2 points, down 179.5 points or 1.68% throughout the day.
