Chapter 1118 The immersion lithography system encounters difficulties

Style: Romance Author: anatomy teacherWords: 2209Update Time: 24/01/18 16:42:16
The patented technology of 800nm ​​process technology is like useless to gca, but it is like a divine help to bsec. Once mastered, it can leapfrog the 1um process technology and master the 800nm ​​process technology.

It has the manufacturing technology of 193nm arfi excimer laser and the patented technology of 800nm ​​process technology, but bsec is not yet able to produce lithography machines with independent intellectual property rights of 1um process technology.

In order not to be choked by the US government in the future and to prepare for a rainy day, bsec must master the three core technologies for producing lithography machines: light source system, optical system and workbench system, and continuously upgrade them.

He urged Deng Guohui, bsec Lithography Machine Light Source Research Institute to study clearly the working principle and manufacturing technology of gmarf excimer laser, and the lithography machine light source company produces it itself; he told Chen Weichang, bsec Lithography Machine Optical Research Institute successfully developed 6-inch wafers and 1um wafers by itself. The optical lenses and reflective lenses used in the process are produced by the lithography machine optics company itself.

Sun Jian promised that bsec would produce lithography machines with 6-inch wafers and 1um process technology with independent intellectual property rights within 2 years. Taobao Holdings would reward the project team with 2 million yuan; within 4 years, bsec would be able to produce a lithography machine with independent intellectual property rights. For the semiconductor production line of 6-inch wafers and 1um process technology, he took out 2 million shares from the bsec shares held by Taobao Holdings to reward technology and production personnel who made significant contributions, but he could not complete the task within the specified time. , start layoffs!

The combination of rewards and layoffs has increased the pressure on management, technical staff and ordinary employees.

Deng Guohui obtained the patented technology of arf excimer laser, and after careful study with Qian Fuqiang, he suddenly became enlightened and applied for 20 million yuan in R&D funds. He led the Lithography Machine Light Source Research Institute to digest and absorb the technical drawings provided by GCA. The patented technology of arf excimer laser...

In February 1995, after a year and a half of research, the Lithography Machine Light Source Company produced a lithography machine with a 6-inch wafer and a 1um process technology.

In September 1995, bsec produced a semiconductor production line with 6-inch wafers and 1um process technology with independent intellectual property rights, filling the domestic technology gap, opening up the domestic market, and finally throwing away the unfavorable situation of huge losses for three years. In 1995 Achieved net profit of 116 million yuan.

On April 20, 1996, bsec obtained the quota for the public issuance of new shares. On June 11, 150 million new shares (including 10 million employee shares) were publicly issued on the Pengcheng Stock Exchange, with an issue price of 6 yuan per share. It raised 873 million yuan (deducting issuance expenses), of which 800 million yuan was used to develop 8-inch wafers and 500nm process lithography machines, and 73 million yuan was used to supplement the company's working capital.

At that time, the 6-inch wafer and 800nm ​​process technology lithography machines developed by bsec were nearing completion.

"Dean Deng, the institute continues to develop lithography machines for 8-inch wafers and 500nm processes."

"Okay, Chairman!"

"Mr. Wei, the company strives to produce a semiconductor production line with 6-inch wafers and 800nm ​​process technology with independent intellectual property rights as soon as possible. When the time comes, PGCA will be the first to order one."

"Okay, Chairman!"

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"Chairman, after nearly 2 years of joint research, research has confirmed that we use deionized water and other means to maintain the cleanliness and temperature of the water so that it does not contain bubbles. We use deionized water as the exposure medium. Although the wavelength of the light source is still The original 193nm, but through the refraction of deionized water, the wavelength that enters the photoresist can be significantly reduced. It is feasible to use immersion technology to break through the 193nm wavelength. The biggest problem we encounter today is that the optical lenses we manufacture cannot meet the 193nm wavelength breakthrough Technical requirements for photolithographic optics.”

Academician Chen Weichang, leader of the joint research group on immersion lithography technology, reported to Sun Jian the latest progress of immersion lithography technology. General Manager Wei Jianguo, Dean Academician Deng Guohui, Vice President Academician Ouyang Min, and Deputy Leader of the Joint Research Group Xia Chang Academician and Researcher Qian Fuqiang, Director of the Institute of Light Sources, were also present.

In 1994, Professor Zhong Dewei and Professor Xia Chang were promoted to academicians of the Academy of Engineering by virtue of their successful research on the world's unique suspended dual workbench system technology project for lithography machines.

In 1995, researcher Chen Weichang was promoted to academician of the Academy of Engineering by virtue of his successful research on the optical system technology project of 1um process technology, and Ouyang Min Research Institute's successful development of 6-inch wafer technology project.

In the same year, associate researcher Qian Fuqiang made significant contributions to the independent manufacturing of arf excimer lasers and was promoted to researcher and served as director of the Lithography Machine Light Source Research Institute.

Academician Deng Guohui no longer serves as the director of the Lithography Machine Light Source Research Institute and concentrates on presiding over the overall research work of the Lithography Machine and Semiconductor Research Institute.

Immersion lithography technology is a strictly confidential research project in bsec. It is the No. 1 ongoing research project and is composed of relevant researchers and senior technicians from the Lithography Machine Optics Research Institute, the Lithography Machine Light Source Research Institute and the Lithography Machine Automation Research Institute. The joint research team is led by Academician Chen Weichang and Academician Xia Chang, and all participants have signed a confidentiality agreement with bsec.

"Vice President Chen, as far as I know, although Cai's company has successfully developed Starlith 900 specifically for GCA and ASML, it is the world's first mass-produced 193nm wavelength lithography optical device and the first to achieve resolution below 100nm. It is a high-efficiency system, but the immersion optical lens is different. Zeiss, Nikon and Canon have not started to develop it yet. We can only develop and produce it ourselves. We don’t need to be too anxious. We can start from scratch step by step. To lay a solid foundation from components to final assembly, the machine equipment and materials that the joint research team needs to purchase can be reported directly to Mr. Wei, and the high-end professional talents that Vice President Chen likes can be handed over to the Human Resources Department to organize the recruitment and introduction."

Holding GCA, as the second largest shareholder of ASML, Zeiss Jena AG, and Carlzeiss AG, it is qualified to know the latest scientific and technological achievements of these companies at the first time. However, the Starlith 900, which was just launched at the beginning of this year, is also among the Wassenaar Agreement export controlled products and According to the technical catalog, it cannot be exported domestically.

EUV lithography machine will not be successfully developed in about ten years. Sun Jian is not panic now and has laid a solid foundation. Even if bsec successfully develops the world's first immersion lithography machine within three years, he plans to hide it and wait for 193nm. When Wavelength encountered the worldwide problem of breaking through the 65nm process technology, it launched this breakthrough patented technology and became a blockbuster!

Don't challenge the United States' position as the leader and leader of high-tech in the world!

The lessons learned from Huawei and ZTE’s previous lives are too profound!

Although Atic can buy 8-inch wafers by investing in memc, Sun Jian told Academician Ouyang Min, who is also the director of the Silicon Wafer Manufacturing Research Institute, to research and produce 8-inch wafers by himself. The new silicon wafer energy industry has a bright future.

The Lithography Machine Light Source Research Institute, the Lithography Machine Optics Research Institute, the Silicon Wafer Manufacturing Research Institute, the Lithography Machine Automation Research Institute, the Etching Machine Research Institute, the Lithography Machine Heat Treatment Research Institute, and the Mask Research Institute under the bsec Lithography Machine Semiconductor Research Institute. The Membrane Research Institute, the Ion Implantation Machine Research Institute and the Lithography Machine Semiconductor Information Department, except for the Lithography Machine Automation Research Institute led by Academician Xia Chang, which ranks first in the global lithography machine automation industry, the others are not ranked among the top ten in the world. There is a long way to go, and we need to continue to invest huge sums of money to recruit top talents from around the world. However, we are ranked first in the lithography machine and semiconductor industry in China. Any company's by-products brought to the market can be among the top three in the country.

"Okay, Chairman!"

Chen Wei breathed a sigh of relief, and the pressure on his shoulders was much less.