April 26th.
Silicon Valley.
gca headquarters.
"The company awarded US$2 million to the gca3500b project department."
On Friday afternoon, Sun Jian received a good news call from Yu Jianguo from the United States, and took a flight to Silicon Valley the next day.
Bang bang...
Adrian, Brody, Thompson and other company executives showed long-lost smiles and felt proud.
The GCA Lithography Machine Semiconductor Research Institute will successfully develop a magnetically suspended dual workbench system suitable for 8-inch wafers and 350nm process technology. It will be installed on a GCA3500a lithography machine. The process technology breaks through 350nm and has passed multiple tests, reaching a maximum of 320nm. , named gca3500b, the process technology surpasses the nikon3500b photolithography machine, and also increases the production efficiency by 47%, setting a new world record!
The successful development of gca3500a at the end of last year was a huge breakthrough. The process technology of the nikon3500b lithography machine looks the same, but due to the installation of a magnetically suspended dual workbench system suitable for 8-inch wafers and 500nm process technology, the process technology and production of gca3500a The efficiency is significantly higher than that of the Nikon3500 lithography machine. After technical certification by the Sematech expert group, II, AMD and HP Semiconductor Equipment Company have ordered five GCA3500A lithography machines.
Immediately afterwards, the GCA shareholders meeting approved and implemented a plan to issue 1 billion new shares to 10 specific investors at a price of US$1.5 per share, of which Peng purchased 300 million shares, Atic purchased 200 million shares, and GCA raised 1.455 million US dollars, cash flow has greatly increased, more than 400 R&D personnel and technical workers have been recalled and recruited, and three photolithography semiconductor equipment production lines have been launched. Now it can produce five gca3500a photolithography machines at the same time.
With the delivery of 5 GCA3500A lithography machines, users have responded well. Companies such as II, AMD and HP have ordered 14 more GCA3500A lithography machines. They also received an 8-inch wafer and other equipment from TSMC worth US$6 billion. Semiconductor production line orders based on gca3500a.
In order to improve the chip production process and unit productivity per hour (wph), a wafer factory (fab) is generally equipped with about 20 photolithography machines on an advanced semiconductor production line, with high and low configurations. Except for the bottom transistor layer, which requires the most advanced In addition to lithography machines, the most advanced lithography machines are not required for copper interconnection technology.
In a semiconductor production line, in addition to the photolithography machine, which accounts for one-third of the cost of the semiconductor production line, it also requires cleaning equipment, high-temperature/oxidation furnace tube annealing equipment, glue leveling machines, drying equipment, developing equipment, etching machines, and A large number of high-precision equipment such as glue machines, ion implantation equipment, cvd/pvd/ald/pecvd/cmp, etc. The largest number are deposition equipment (including pvd cvd), etching equipment (icp, ccp, die) and heat treatment equipment (rtp ), 60% of gca now needs to be ordered from other semiconductor equipment factories and then integrated into the system.
GCA now focuses on the production of photolithography machines, etching machines, silicon wafers, photoresists, masks and ion implanters. The reborn people are not worried about GCA being sanctioned!
GCA's stock price is now US$2.95. Once the news of the successful development of gca3500b is announced to the public, the stock price may exceed US$4 the next day.
GCA's strategic investors have made a lot of money, and they admire the richest man in China for his ability to turn stone into gold.
After the successful development of gca3500a, the U.S. Department of Commerce and sematech sent congratulatory messages, and Mayor Brown of San Jose came to congratulate him.
GCA's management, technical team and ordinary employees are happy and motivated.
With the successful development of the gca3500b lithography machine, gca has returned to the top of the world's lithography machines and once again led the development of the global lithography machine industry. Its significance to gca is like a rebirth from the ashes and a phoenix rising from the ashes. It has achieved temporary success in the competition with the Japanese semiconductor industry. The leading advantage is also of great significance to the development of the US semiconductor industry.
Nearly 80% of global high-end chip orders come from U.S. high-tech companies such as II, AMD, and HP, all of which are Sematech members.
Sematech is also proud to catch up with the common goal of Nikoech members. American semiconductor equipment and production companies such as II, AMD and HP will be the first to reserve the GCA3500B lithography machine and the semiconductor production line mainly composed of the GCA3500B lithography machine.
According to the patent technology transfer agreement signed by both parties, the magnetic levitation dual workbench system technology developed by gca and suitable for 8-inch wafers and 350nm process technology will be handed over to bsec, and bsec will apply for the company's invention patents in the domestic patent office and the international patent office respectively.
All beginnings are hard!
The bsec Lithography Machine Workbench Research Institute has now successfully developed a magnetically suspended dual workbench system suitable for 5-inch wafers and 1um process technology, 6-inch wafers and 1um process technology, and 6-inch and 800nm process technologies.
After more than 6 months of waiting, bsec obtained the company’s invention patent certificate for the 5-inch wafer and 1.5um process lithography machine from the National Patent Office.
A 5-inch wafer and 1.5um process semiconductor production line produced by bsec for Huayue Semiconductor Company is under orderly production.
The production technology of 5-inch wafers and 1.5um process lithography machines has not yet obtained the company's invention patent approved by the World Patent Office.
According to the Western way of doing things, you can't get it within 18 months.
bsec has submitted patent applications suitable for 5-inch wafer and 1um process technology, 6-inch wafer and 1um process technology, 6-inch and 800nm process, 8-inch and 500nm process technology, 8-inch and 350nm process technology respectively in the domestic patent office and the world patent office. The company's invention patent application for the magnetic levitation double workbench system.
The first three items are company invention patented technologies successfully developed by bsec, and the last two are company invention patented technologies successfully developed by gca.
According to the patent technology transfer agreement signed by both parties, gca only has the right to use the patented technology of the magnetic levitation dual workbench system suitable for 8-inch and 500nm process technologies, and 8-inch and 350nm process technology, and does not have the right to transfer patented technology.
Before the successful development of the arfi excimer laser, the bsec Lithography Machine Workbench Research Institute continued to develop magnetically suspended dual workbench systems suitable for 8-inch and 500nm process technologies, 8-inch and 350nm process technologies, and successfully developed a dual-workbench system with gca Make comparisons, learn from each other's strengths, and reserve technology for the development of a magnetically suspended dual workbench system adapted to immersion lithography systems.
According to the Patent Law revised in 1992, the domestic invention patent protection period has become 20 years, and the utility model patent right and design patent right period are 10 years, both calculated from the date of application.
As long as the re-applied new invention patent is more advanced than the previous invention patent, the protection period of the invention patent can be extended forever, forming a de facto technology monopoly, just like the Windows system!
"General Manager Adrian, apply for the stock suspension tomorrow, invite the sematech expert group to conduct technical certification on gca3500b, and after obtaining the certification and appraisal, apply for the company's invention patent, and invite semiconductor manufacturing companies such as II, AMD, HP, Samsung and TSMC to visit gca3500b Lithography machine prototype.”
From Yu Jianguo’s words, I learned that GCA’s stock price fell slightly this morning, and the extremely good news was not leaked!
"Okay, Chairman!"
"General Manager Adrian, how many thousands of dollars will the production cost of our newly developed gca3500b lithography machine be? How much is the ex-factory price going to be?"
The market price of a Nikon3500b lithography machine is now US$37 million.
"Mr. Sun, according to preliminary calculations, the cost is US$18 million, and the market price is set at US$40 million."
"General Manager Adrian, once the news gets out, I predict that the price of the Nikon3500b lithography machine will definitely drop significantly. Our market price will be US$35 million. Small profits but quick turnover will benefit customers."
Today, Nikon Lithography Machine Equipment Company is developing a lithography machine with 8-inch wafers and 250nm process technology. Once successfully developed, it will squeeze the market share of gca3500b.
"Okay, Chairman Sun!"
Look at my 1985.
