Although Nikon has successfully developed F2 excimer laser and immersion lithography technology and successfully produced immersion lithography machines by relying on its technical and financial strength in the previous life, the rapid upgrading of the semiconductor industry has resulted in the reliability and performance of Nikon lithography machines always lagging behind ASML. , Since then, Nikon, the world's leader in high-end lithography machines, has gradually lost to ASML, the new global leader in lithography machines.
In the past, no one could develop ASML's unique EUV light source, and the technology of domestic lithography machine light source production companies was not competitive. Western countries, led by the United States, did not restrict the export of ArF excimer lasers and ArFi excimer lasers.
BSEC can directly import GCA brand ArF excimer lasers with a market price of US$455,000 each, purchase optical systems produced by Zeiss, import 6-inch wafers, and add the original magnetically suspended dual workbench system of lithography machines. Although the semiconductor production lines for 6-inch wafers and 1um process technology are obsolete in Western countries, they still have a large market in China for producing photolithography machines with 1um process technology.
BSEC can survive!
The ideal is beautiful, but the reality is very skinny. BSEC is a photolithography machine that can produce 1um process technology. It does not mean that it can produce 6-inch wafers and a semiconductor production line with 1um process technology!
The country lacks the entire industrial chain of semiconductor production line equipment, and now it all falls on the shoulders of BSEC.
No wafer company will use the 1um lithography machine produced by BSEC!
Whoever invests will be unlucky. This is the main reason why "building is worse than buying, and buying is worse than renting"!
Fortunately, the worldwide optical problem of 193nm wavelength will confuse the lithography industry for eight years, giving BSEC an opportunity to grow. Otherwise, there is nothing the reborn company can do.
BSEC's breakthrough point was to take the lead in developing the world's first 193nm wavelength immersion lithography machine before ASML!
All Sun Jian's operations revolve around this breakthrough point!
EUV lithography machines are too complex. Even if a huge amount of money is invested in the successful development of EUV light sources, the requirements for related optical systems, photoresists, masks and other equipment and materials are too demanding, requiring 100,000 parts. It is said that there were More than 5,000 manufacturers supply EUV lithography machines, but those born again are still afraid to put them into practice.
"Chairman Sun, can BSEC not transfer the magnetic levitation dual workbench system patent to Nikon?"
With the lifetime authorization of BSEC's magnetic levitation dual workbench system patent, the GCA Lithography Machine Optical Precision Equipment Research Institute has upgraded and renovated. As long as it successfully develops a magnetic levitation dual workbench system that can adapt to the 800nm process technology (the patented technology cannot be sold or transferred), The process technology of GCA lithography machine may reach 500nm, reaching the process technology of Nikon lithography machine. Purchasing 8-inch wafers produced by Hughes Electronic Materials Company (AEMC) can also increase production capacity by about 35%.
With the magnetically suspended dual-stage system and Zeiss' optical system, Gikon regains its capital to compete for market share of high-end lithography machines.
But the prerequisite is BSE.
"General Manager Adrian, it will take about 18 months to get the company's invention patent issued by Japan, Europe and the United States for the photolithography machine's magnetically suspended dual worktable system developed by BSEC."
"Chairman Sun, I'm relieved!"
Adrian felt a lot more relaxed immediately, Chairman Sun was quite humorous.
"Dean Thompson, the company's funds are tight now. Should the Light Source Research Institute continue to develop ArF excimer lasers? Or start developing F2 excimer lasers like Nikon?"
"Chairman Sun, I think the Light Source Research Institute should find another way and start developing extreme ultraviolet light with a wavelength of only a dozen nanometers?"
GCA successfully developed the ArF excimer laser in 1985 and is a global leader in the field of light sources for lithography machines. However, in terms of the optical system composed of lenses and mirrors, it is inferior to Nikon Semiconductor Equipment Company's continuously improved optical system. The light source has been stuck at the 193nm wavelength for many years, and has encountered a recession in global chip production. The dominance of lithography machines has gradually been taken away by Nikon Semiconductor Equipment Company, which continues to improve its optical systems. It has suffered losses every year, with the company laying off employees and losing technical personnel. It was reduced to the point where it was sold at a low price twice.
"Dean Thompson predicts how long it will take the Light Source Institute to successfully develop extreme ultraviolet light?"
Sun Jian was overjoyed. It was not that he did not want to invest in the development of extreme ultraviolet light, but he was worried that the investment would be too large. Even if the development was successful, GCA would not be able to produce EUV without the supporting optical system and suitable photoresist, mask, etc. Lithography!
In the past life, the whole country's efforts to develop 13.5nm EUV light sources had no results. In the world, only Cymer, controlled by ASML, can produce EUV light sources. This shows how difficult it is!
In terms of lithography machine light sources, Cymer, a rising star in lithography machine light sources, is not GCA’s opponent yet.
Cymer was able to become the overlord of lithography machine light sources in its previous life. In addition to continuously investing heavily in research and development after being acquired by ASML, ASML also merged the acquired GCA lithography machine light source research institute into the Cymer lithography machine light source research institute, forming a strong alliance.
In the past life, extreme ultraviolet light technology was successfully developed. I wonder what role Dean Thompson played in it?
The research focus of GCA Lithography Semiconductor Research Institute should be on the development of technologically leading ArF excimer lasers and KrF photoresists.
GCA and IBM are both Sematech members. The winner takes all, avoiding duplication of research, and not worrying about IBM being stuck. IBM has monopolized KrF photoresist for more than ten years, but I don’t know why? In the previous life, Japanese companies such as Shin-Etsu Chemical excelled in photoresist, and even choked the necks of Koreans!
"Chairman Sun, as long as the research and development funds of the Light Source Research Institute can be guaranteed, I guarantee that the Light Source Research Institute will successfully develop extreme ultraviolet light within three years."
"Dean Thompson, how much research and development funding does the Light Source Research Institute need?"
Dean Thompson is not a young man, and if he dares to vouch for it, it shows that he is absolutely sure that reborn people are not afraid of spending money! Once EUV is conquered, can EUV lithography machines be produced? GCA will become the leader in the lithography machine industry!
"Chairman, I need 30 million US dollars in research and development funding to purchase new experimental machines and materials."
Adrian, Brody and others have mixed feelings. The company's current cash flow is only more than three million US dollars, and there are many places to spend money.
"Dean Thompson, I promise you now. If the Light Source Institute successfully develops extreme ultraviolet light technology within three years, I promise to reward the R&D team of the Light Source Institute for lithography machines with five million US dollars, of which one million US dollars will be awarded to Dean Thompson. .”
US$30 million in this era is equivalent to US$3 billion twenty years later. It can acquire 40% of ASML's equity, which is not a small sum!
Even if he spends 30 million US dollars and fails to develop successfully within three years, Sun Jian believes that GCA's lithography machine light source technology and process technology will advance by leaps and bounds.
Everyone looked surprised.
"Thank you, Chairman!"
Thompson was also stunned.
The first is the first, and the reborn are second-hand. Of course, I hope that Dean Thompson will lead the GCA Lithography Machine Light Source Research Institute and take the lead in successfully developing EUV. After becoming the overlord of the lithography machine again, GCA will acquire Cymer and AEMC, and the powerful alliance will be the acquisition of SVG and Ultratech. To become the only lithography machine company in the United States, competing with Nikon and Nikon, the US government will also support it.
